DOI QR코드

DOI QR Code

Preparation and Characterization of β-C3N4 in Presence of Seed Carbon Nitride Films Deposited by Laser-Electric Discharge Method

  • Kim, J.I. (School of information technology, Korea University of Technology and Education) ;
  • Zorov, N.B. (Department of Laser Chemistry, Moscow state University) ;
  • Burdina, K.P (Department of Laser Chemistry, Moscow state University)
  • Published : 2002.09.01

Abstract

A procedure was developed for preparing bulk carbon nitride crystals from a polymeric $\alpha$ -C$_3$N$\_$4.2/ at high pressure and temperature in the presence of seeds of crystalline carbon nitride films prepared by a high voltage discharge plasma combined with pulsed laser ablation of graphite target. The samples were evaluated by x-ray photoelectron spectroscopy (XPS), infrared (IR) spectroscopy, Auger electron spectroscopy (AES), secondary-ion mass spectrometry (SIMS), scanning electron microscopy (SEM) and x-ray diffraction (XRD). Notably, XPS studies of the film composition before and after thermobaric treatments demonstrate that the nitrogen composition in $\alpha$ -C$_3$N$\_$4.2/ material initially containing more than 58% nitrogen decreases during the annealing process and reaches a common, stable composition of ~45%. The thermobaric experiments were performed at 10-77 kbar and 350-1200 $\^{C}$.

Keywords

References

  1. A. Y. Liu and M. L. Cohen, 'Prediction of new low compressibility', Science, Vol. 245, p. 841, 1989 https://doi.org/10.1126/science.245.4920.841
  2. Jong-Il Kim and Seon-Gi. Bae, 'Preparation and characterization of crystalline carbon nitride', J. of KIEEME(in Korean), Vol. 14, No. 10, p. 835, 2001
  3. J. I. Kim, PhD. Thesis, 'Preparation of crystalline carbon nithde: thin films and bulk samples', M. V. Lomonosov Moscow State University, Moscow, 1999
  4. M. Tabbal, P. Merel, S. Moisa, M. Chaker, A. Ricard, and M. Moisan, 'X-ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge', Appl. Phys. Lett, Vol. 69, No. 12, p. 1698, 1996 https://doi.org/10.1063/1.118000
  5. D. Marton, K. J. Boyd, A. H. Al-Bayati, S. S. Todorov, and J. W. Rabalasis, 'Carbon nitride deposited using energetic species : A tow-phase system', Phys. Rev. Lett, Vol. 73, p. 118, 1994 https://doi.org/10.1103/PhysRevLett.73.118
  6. P. Hammer, N. M. Victoria, and F. Alvarez, 'Electronic structure of hydrogenated carbon nitride films', J. Vac. Sci. Technol., A, Vol. 16, p.2941, 1998 https://doi.org/10.1116/1.581443
  7. S. Bhattacharya, C. Carinaud, and G. Turban, 'Spectroscopic determination of the structure of amorphous nitrogenated carbon films', J. Appl. Phys., Vol. 83, No. 8, p. 4491, 1998 https://doi.org/10.1063/1.367211
  8. H. W. Song, F. Z. Cui, X. M. He, W. Z. Li, and H. D. Li, 'Carbon nitride films synthesized by NHg-ion-assisted', J. Phys.: Conden. Matt., Vol. 6, p. 6125, 1994 https://doi.org/10.1088/0953-8984/6/31/011
  9. O. V. Kravchenko, K. P. Burdina, K. N. Semenenko, A. M. Matveev, G. M. Tarasova, and S. A. Kulinich 'Synthesis and some properties of amorphous carbon nitride C$_3N_4$', Exp. Geosci., Vol. 6, No. 2, p. 64,1997
  10. Jong-Il Kim, 'Effect of a laser ablation on high voltage discharge plasma area for carbon nitride film deposition', J. of KIEEME(in Korean), Vol. 15, No. 6, p. 551,2002
  11. Jong-Il Kim and Seon-Gi. Bae, 'Influence of a magnetic field on high voltage discharge plasma area for carbon nitride film deposition', J. of KIEEME(in Korean), Vol. 15, No. 2, p. 184, 2002
  12. D. M. Teter and R. J. Hemley, 'Low-Compressibility Carbon Nithdes', Science, Vol. 271,p.53,1996 https://doi.org/10.1126/science.271.5245.53
  13. R. Alexandrescu, F. Huisken, A. Crunteanu, S. Petcu, S. Cojocaru, S. Cireasa, and I. Morjan, 'Preparation of carbon lutride film powder by laser induced gas-phase reaction', Appl. Phys. A, Vol. 65, p.207,1997 https://doi.org/10.1007/s003390050568
  14. C. Jama, V. Rousseau, O. Dessaux, and P. Goudmand, 'Carbon nitride CN$_x$ film deposition by IR laser ablation in a cold remote nitrogen plasma', Thin Solid Films, Vol. 302, p. 58, 1997 https://doi.org/10.1016/S0040-6090(96)09541-7
  15. M. Kohzaki, A. Matsumuro, T. Hayashi, M. Muramatsu, and K. Yamaguch, 'Preparation of carbon nitride thin films by ion-beam assisted deposition and their mecanical properties', Thin Solid Films Vol. 308/309, p. 239, 1997 https://doi.org/10.1016/S0040-6090(97)00420-3
  16. P. Hammer, M. A. Baker, C. Lenardi, and W. Gissler, 'Synthesis of carbon nitride films at low temperature', J. Vac. Sci. Technol. A, Vol. 15, No. 1, p.107,1997 https://doi.org/10.1116/1.580481