Electrical & Electronic Materials (E2M - 전기 전자와 첨단 소재)
- Volume 15 Issue 9
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- Pages.10-14
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- 2002
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- 2982-6268(pISSN)
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- 2982-6306(eISSN)
Applications of Plasma Modeling for Semiconductor Industry
Abstract
Plasma processing plays a significant role in semiconductor devices technology. Development of new plasma systems, such as high-density plasma reactors, required development of plasma theory to understand a whole process mechanism and to be able to explain and to predict processing results. A most important task in this way is to establish interconnections between input process parameters (working gas, pressure flow rate input power density) and a various plasma subsystems (electron gas, volume and heterogeneous gas chemistry, transport), which are closely connected one with other. It will allow select optimal ways for processes optimizations.