Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Effect of Mixed Gases on Decomposition Characteristic of CF4 by Non-Thermal Plasma

비열플라즈마를 이용한 CF4 분해에 미치는 혼합가스의 영향

  • 박재윤 (경남대학교 전기·전자공학부) ;
  • 정장근 (경남대학교 전기·전자공학부) ;
  • 김종석 (경남대학교 전기·전자공학부) ;
  • 임근희 (한국전기연구원)
  • Published : 2002.06.01
Download PDF
⟨ Previous Next ⟩

Abstract

In this paper, the $CF_4$ decomposition rate and by-product were investigated for two simulated plasma reactors which are metal particle reactor and spiral wire reactors as a function of mixed gases. The $CF_4$ decomposition rate by plasma reactor with metal particle electrode had a gain of 20~25% over that by plasma reactor with spiral wire electrode. The $CF_4$ decomposition efficiency increases with increasing applied voltage up to the critical voltage for spark formation. The $CF_4$ decomposition efficiency of metal particle reactor was about 80% at AC 24kV. The $CF_4$ decomposition rate used Ar-$N_2$ as base gas was the highest among three base gases of $N_2$, $Ar-N_2$, air. The by-products of the $N_2$, $N_2Ar$ base as were similar, but in case of air base they were different.

Keywords

References

  1. IEEE transactions on industry applications v.28 no.3 Control of volatile organic compounds by an ac energized ferroelectric pellet reactor and a pulsed corona reactor T.Yamamoto https://doi.org/10.1109/28.137430
  2. IEEE Trans. on industry applications v.32 no.1 Decomposition of gaseous organic contaminants by surface discharge induced plasma chemical processing T.Oda https://doi.org/10.1109/28.485822
  3. IEEE Transactions on industry applications v.29 no.4 Decomposition of fluorocarbon gaseous contaminants by surface discharge-induced plasma chemical processing T.Oda https://doi.org/10.1109/28.231995
  4. J. of Korean Ind. & Eng. Chemistry v.9 no.6 열플라즈마에 의한 CFC의 분해공정 차우병;최경수
  5. 전기전자재료학회논문지 v.10 no.4 e-CF4산란중에서 전자군의 확산계수 및 에너지분포함수 연구 하성철;임상원
  6. IEEE transactions on industry applications v.36 no.5 Removal of NF₃from semiconductor-process flue gases by tandem packed-bed plasma and adsorbent hybrid systems J.S.Chang https://doi.org/10.1109/28.871272
  7. J. of Colloid and interface science Ozone degradation by fluoride onto plasma-treated activated carbon in CF₄ S.Tanada;N.Kawasaki;T.Ohue
  8. IEEE transactions on industry applications v.36 no.3 Plasma-assisted chemical process for NOx control T.Yamamoto https://doi.org/10.1109/28.845073
  9. 전기전자재료학회논문지 v.10 no.8 펄스 스트리머 방전을 이용한 NOx 제거 박재윤;김건호;고희석
  10. 전기전자재료학회논문지 v.14 no.9 CF₄/Ar 플라즈마 내 Cl₂첨가에 의한 SrBi₂ Ta₂O/sub 9/박막의 식각 특성 김동표;김창일;이원재
  11. 한국전기전자재료학회 2001년 추계학술대회논문집 다항근사 볼츠만 방정식에 의한 CF₄분자가스의 전자수송계수 해석 전병훈;박재준;하성철