Journal of the Korean Society of Industry Convergence (한국산업융합학회 논문집)
- Volume 4 Issue 3
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- Pages.329-337
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- 2001
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- 1226-833X(pISSN)
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- 2765-5415(eISSN)
Simulation of Miniaturized n-MOSFET based Non-Isothermal Non-Equilibrium Transport Model
디바이스 시뮬레이션 기술을 이용한 미세 n-MOSFET의 비등온 비형형장에 있어서의 특성해석
- Choi, Won-Cheol (Device Engineering Team Hynix Semiconductor Hosei University)
- 최원철 (하이닉스반도체 System IC 소자기술팀)
- Received : 2001.04.20
- Accepted : 2001.08.16
- Published : 2001.08.31
Abstract
This simulator is developed for the analysis of a MOSFET based on Thermally Coupled Energy Transport Model(TCETM). The simulator has the ability to calculate not only stationary characteristics but also non - stationary characteristics of a MOSFET. It solves basic semiconductor devices equations including Possion equation, current continuity equations for electrons and holes, energy balance equation for electrons and heat flow equation, using finite difference method. The conventional semiconductor device simulation technique, based on the Drift-Diffusion Model (DDM), neglects the thermal and other energy-related properties of a miniaturized device. I, therefore, developed a simulator based on the Thermally Coupled Energy Transport Model (TCETM) which treats not only steady-state but also transient phenomena of such a small-size MOSFET. In particular, the present paper investigates the breakdown characteristics in transient conditions. As a result, we found that the breakdown voltage has been largely underestimated by the DDM in transient conditions.
Keywords
- Device simulation;
- Drift Diffusion Model;
- TCAD;
- Miniaturized MOSFET Analysis;
- Non-Equilibrium Transport Model