Journal of the Korean Solar Energy Society (한국태양에너지학회 논문집)
- Volume 21 Issue 1
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- Pages.1-10
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- 2001
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- 1598-6411(pISSN)
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- 2508-3562(eISSN)
Growth and Characterization of Polycrystalline Silicon Films by Hot-Wire Chemical Vapor Deposition
열선 CVD에 의해 증착된 다결정 실리콘 박막의 구조적 특성 분석
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Lee, J.C.
(Korea Institute of Energy Research) ;
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Kang, K.H.
(Korea Institute of Energy Research) ;
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Kim, S.K.
(Korea Institute of Energy Research) ;
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Yoon, K.H.
(Korea Institute of Energy Research) ;
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Song, J.
(Korea Institute of Energy Research) ;
- Park, I.J. (Korea Institute of Energy Research)
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이정철
(한국에너지기술연구원) ;
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강기환
(한국에너지기술연구원) ;
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김석기
(한국에너지기술연구원) ;
-
윤경훈
(한국에너지기술연구원) ;
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송진수
(한국에너지기술연구원) ;
- 박이준 (한국에너지기술연구원)
- Published : 2001.03.31
Abstract
Polycrystalline silicon(poly-Si) films are deposited on low temperature glass substrate by Hot-CVD(HWCVD). The structural properties of the poly-Si films are strongly dependent on the temperature