Journal of the Korean Chemical Society (대한화학회지)

Korean Chemical Society (대한화학회)
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Silica Sulfuric Acid/Wet $SIO_2$as a Novel System for the Deprotection of Acetals by Using Microwave Irradiation under Solvent Free Conditions

무용매 조건하에서 황산/젖은 $SIO_2$와 마이크로웨이브를 이용한 아세탈의 새로운 탈보호기 방

  • Published : 20011200
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Abstract

Neat chlorosulfonic acid reacts with silica gel to give silica sulfuric acid in which sulfuric acid is immobilized on the surface of silica gel via covalent bond. A combination of silica sulfuric acid and wet SiO$_2$ was used as an effective deacetalizating agent for the conversion of acetals to their corresponding carbonyl derivatives by using microwave irradiation under solvent free conditions.

클로로술폰산을 실리카겔과 반응시키면 실리카겔 표면에 황산이 공유결합으로 고정된 실리카황산을 얻게 된다. 무용매 조건하에서 마이크로웨이브를 쪼여주면서 실리카 황산과 젖은 $SiO_2$를 함께 사용하게 되면 아세탈을 화합물로 변화시키는 효과적인 탈아세탈 시약으로 사용할 수 있다.

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