Novel Interface-engineered Junction Technology for Digital Circuit Applications

  • Yoshida, J. (Corporate Research & Development Center, Toshiba Corporation) ;
  • Katsuno, H. (Corporate Research & Development Center, Toshiba Corporation) ;
  • Inoue, S. (Corporate Research & Development Center, Toshiba Corporation) ;
  • Nagano, T. (Corporate Research & Development Center, Toshiba Corporation)
  • Published : 2001.01.01

Abstract

Interface-engineered junctions with $YbBa_2$$Cu_3$$O_{7}$ as the counter electrode were demonstrated. The junctions exhibited excellent Josephson characteristics with a Josephson critical current ($I_{c}$) ranging from 0.1 mA to 8 mA and a magnetic field modulation of the $I_{c}$ exceeding 80% at 4.2 K while maintaining complete c-axis orientation of the counter-electrode layer. The$ 1\sigma$ spreads in $I_{c}$ for junctions with an average $I_{c}$ of 1-2 mA were 5-8% for 16 junctions within a chip, and 9.3% for a 100-junction array. Our dI/dV measurements suggest that a theoretical approach taking into account both a highly transparent barrier and the proximity effect is required to fully understand the Junction characteristics.ristics.

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