HTS Josephson Junctions with Deionized Water Treated Interface

증류수 계면처리를 이용한 고온초전도체 죠셉슨 접합 제작

  • Moon, S.H. (LG Electronics Institute of Technology) ;
  • Park, W.K. (Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology) ;
  • Kye, J.I. (LG Electronics Institute of Technology) ;
  • Park, J.D. (LG Electronics Institute of Technology) ;
  • Oh, B. (LG Electronics Institute of Technology)
  • 문승현 ;
  • 박완규 ;
  • 계정일 ;
  • 박주도 ;
  • 오병두
  • Published : 2001.01.01

Abstract

We have fabricated YBa$_2$Cu$_3$$O_{7-x}$ (YBCO) ramp-edge Josephson junctions by modifying ramp edges of the base electrodes without depositing any artificial barrier layer. YBa$_2$Cu$_3$O/7-x//SrTiO$_3$ (YBCO/STO) films were deposited on SrTiO$_3$(100) by on-axis KrF laser deposition. After patterning the bottom YBCO/STO layer, the ramp edge was cleaned by ion-beam and then reacted with deionized water under various conditions prior to the deposition of counter-electrode layers. The top YBCO/STO layer was deposited and patterned by photolithography and ion milling. We measured current-voltage (I-V) characteristics, magnetic field modulation of the critical current at 77 K. Some showed resistively shunted junction (RSJ)-type I-V characteristics, while others exhibited flux-flow behaviors, depending on the dipping time of the ramp edge in deionized water. Junctions fabricated using optimized conditions showed fairly uniform distribution of junction parameters such as I$_{c}$R$_{n}$ values, which were about 0.16 mV at 77 K with 1$\sigma$~ 24%. We made a dc SQUID with the same deionized water treated junctions, and it showed the sinusoidal modulation under applied magnetic field at 77 K. 77 K.

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