Transactions on Electrical and Electronic Materials
- Volume 2 Issue 1
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- Pages.1-6
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- 2001
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- 1229-7607(pISSN)
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- 2092-7592(eISSN)
$C_{x}F_{y}$ Polymer Film Deposition in rf and dc $C_{7}F_{16}$ Vapor Plasmas
- Sakai, Y. (Graduate School of Engineering, Hokkaido University) ;
- Akazawa, M. (Graduate School of Engineering, Hokkaido University) ;
- Sakai, Yosuke (Graduate School of Engineering, Hokkaido University) ;
- Sugawara, H. (Graduate School of Engineering, Hokkaido University) ;
- Tabata, M. (Graduate School of Engineering, Hokkaido University) ;
- Lungu, C.P. (National Institute of Lasers, Plasma and Radiation Physics) ;
- Lungu, A.M. (National Institute of Lasers, Plasma and Radiation Physics)
- Published : 2001.03.01
Abstract
Keywords
- Fluorocarbon plasma;
- low dielectric constant film;
- precursor;
- plasma-enhanced chemical vapor deposition;
- material characterization