태양에너지 (Solar Energy)
- 제20권2호
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- Pages.55-65
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- 2000
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- 0253-3103(pISSN)
이온빔 스퍼터링 증착 ITO 박막의 미세 구조와 전기적 특성
The electrical properties and microstructure of ITO films deposited by ion beam sputtering
- Han, Y.G. (Division of Materials Science Engineering, Korea University) ;
- Cho, J.S. (Division of Materials Science Engineering, Korea University) ;
- Koh, S.K. (Division of Materials Science Engineering, Korea University) ;
- Kim, D.H. (Thin Film Technology & Research Center, Korea Institute of Science and Technology)
- 발행 : 2000.06.30
초록
이온빔 스퍼터링을 이용하여 Indium tin oxide (ITO)박막을 증착하였다. Ar 가스만을 이용하여 플라즈마를 형성한 경우와
Better electrical and optical properties of ITO thin films were demanded for the window layer of CdS/CdTe solar cells. To match that demand, an ion beam sputtering system was used for the deposition of ITO thin films. The substrate temperature and ion beam energy were controlled to deposit high quality ITO thin films in two cases of Ar ion sputtering and Ar+
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