한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제33권4호
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- Pages.229-232
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- 2000
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
타겟간 거리 변화에 따른 ZnO박막의 c-축 배향성에 관한 연구
A study on the c-axis Orientation of ZnO Thin Films as a funtion of inter targets distance
초록
C-axis oriented zinc oxide thin films were deposited on glass substrate by reactive Facing Targets Sputtering (FTS) system. The characteristics of zinc oxide thin films on power, inter targets distance, and substrate temperature were investigated by XRD(x-ray diffractometer), alphastep (Tencor) analyses. The Facing Targets Sputtering system can deposit thin film in plasma-free situation and change the deposition condition in wide range. The excellently c-axis oriented zinc oxide thin films were obtained at sputter pressure 1mTorr, sputtering current 0.4A, substrate temperature
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