타겟간 거리 변화에 따른 ZnO박막의 c-축 배향성에 관한 연구

A study on the c-axis Orientation of ZnO Thin Films as a funtion of inter targets distance

  • 성하윤 (경원대학교 공대 전기전자공학부) ;
  • 금민종 (경원대학교 공대 전기전자공학부) ;
  • 손인환 (신성대학 전기과) ;
  • 김경환 (경원대학교 공대 전기전자공학부)
  • 발행 : 2000.08.01

초록

C-axis oriented zinc oxide thin films were deposited on glass substrate by reactive Facing Targets Sputtering (FTS) system. The characteristics of zinc oxide thin films on power, inter targets distance, and substrate temperature were investigated by XRD(x-ray diffractometer), alphastep (Tencor) analyses. The Facing Targets Sputtering system can deposit thin film in plasma-free situation and change the deposition condition in wide range. The excellently c-axis oriented zinc oxide thin films were obtained at sputter pressure 1mTorr, sputtering current 0.4A, substrate temperature $300^{\circ}C$, inter targets distance 100mm. In the conditions, the rocking curve of zinc oxide thin films deposited on ZnO/Glass was $3.9^{\circ}$.

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