Acknowledgement
Supported by : 한국과학재단
References
- Thin Solid Films v.241 G. Emig(et al.)
- Thin Solid Films v.252 S. Gougard(et al)
- Chem. Eng. Sci. v.54 H. Komiyama;Y. Shimogaki;Y. Egashira
- Thin Solid Films v.225 K. Kim;S. Choi;K. L. Wang
- Proc. 5th Conf. on Carbon v.1 R. J. Bickerdike;A. R. G. Brown;G. Hughes;H. Ranson
- Proc. Electrochem. Soc. v.5 S. C. Jung;I. Nobuyuki;H. C. Park
- Chem. Eng. Sci. v.51 J. L. Castillo
- Proceedings of the 5th International Carbon Conference in Essen R. moene;M. Makkee;J. Schoonman;J. A. Moulijn
- Dutch Patent Appl, 93.00816 R. Moene;F. W. Tazelaar;M. Makkee;J. A. Moulijn
- Chem. Eng. Sci. v.54 K. J. Marschall;L. Mieczko
- J. Mater. Sci. v.28 Y. M. Kim;J. S. Song;S. W. Park;J. G. Lee
- J. Cryst. Growth v.28 F. Kobayashi;K. I. Kawa;K. Iwamoto
- Chem. Eng. Sci. v.46 G. Y. Chung
- Rate of Chemical vapor deposition of SiC and Si on single-layer woven fabrics G. Y. Chung;D. E. Cagliostro;B. J. McCoy;J. M. Smith
- Appl. Catal v.20 M. A. Vannice;Y-L Chao;R. M. Friedman
- Adv. Mater. v.3 R. W. Chorley;P. W. Lednor
- AICHE J. v.39 G. Y. Chung;B. J. McCoy;J. M. Smith;D. E. Cagliostro
- HWAHAK KONGHAK v.29 C. H. Chung;H. J. Yoon;S. C. Park;S. H. Moon
- HWAHAK KONGHAK v.33 Y. S. Lee;S. K. Ryu;B. S. Rhee