References
- J. Cera. Soc. Jpn v.103 Review on Future Ferroelectric Nonvolatile Memory : FeRAM-From the Point of View of Epitaxial Oxide Thin Films- Masayuki Suzuki
- Jpn. J. Appl. Phys. v.68 Fatigue properties of ferroelectric PZT Thin Film and Their Characterization H. M. Duiker;P. D. Cuchiaro;L. D. McMillan
- Nature v.34 Fatigue-free ferroelectric capacitors with platinum electrodes C. A. Paz de Araujo;J. D. Cuchiaro;L. D. McMillan;M. C. Scott;J. F. Scott
-
Jpn. J. Appl. Phys.
v.34
Characteristic of Bismuth layered
$SrBi_2Ta_2O_9$ thin-film capacitors and comparison with Pb(Zr,Ti)0₃ Takashi Mihara;Hiroyaki Yoshimori;Hitoshi;Watanebe;Carlos A. Paz de Araujo - MRS Bulletin, Electroceramic Thin Films Solution Deposition of Ferroelectric Thin Films B. A. Tuttle;R. W. Schwartz
-
Integrated Ferroelectrics
v.14
New Low Temperature Processing of Sol-Gel
$SrBi_2Ta_2O_9$ Thin Films Yasuyuki Ito;Maho Ushikubo;Seiichi Yokoyama;Hironori Matsunaga -
Mat. Res. Soc. Symp. Proc.
v.433
The Evaluation of
$SrBi_2Ta_2O_9$ Thin Films for Ferroelectric Memories C. D. Gutleben - 전기전자재료학회논문지 v.10 no.3 MOD법에 의한 강유전성 SrxBiyTa₂O9+α(SBT)박막의 제조 및 후열처리 효과에 관한 연구 정병직;신동석;윤희성;김병호
-
Jpn. J. Appl. Phys.
v.36
Role of Excess Bi in
$SrBi_2Ta_2O_9$ Thin Film Prepared Using Chemical Liquid Deposition and Sol-Gel Method Ichiro Koiwa;Yukihisa Okada;Juro Mita;Akira Hashimoto;Yoshihiro Sawada -
Integrated Ferroelectrics
v.17
Development of a New Annealing Process to allow New Top Electrode Materials for
$SrBi_2Ta_2O_9$ Capacitors Koji Wadanabe;Masahiro Tanaka;Nicolas Nagel;Kenji Katori;Masataka Sugiyama;Hisatoshi Yamoto;Hajime Yagi -
Ferroelectric Thin Films Ⅵ
v.493
$(1-x)SrBi_2Ta_2O_9 - xBi_3Ti(Ta_yNb_{1-y})O_9$ Layered Structure Solid solutions for Ferroelectric Random Access Memory Devices P. C. Joshi;S. O. Ryu;S. Tirumala;S. B. Desu - Jpn. J. Appl. Phys. v.34 Preparation of Bi-Based Ferroelectric Thin Films by Sol-Gel Method Tsutomu Atsuki;Nobuyuki Soyama;Tadashi Yonezawa;Katsumi Ogi
- Integrated Ferroelectrics v.6 A model of voltage-dependent dielectric losses for ferroelectric MMIC devices J. F. Scott(et al.)
-
Jpn. J. Appl. Phys.
v.37
Imprint Characteristics of
$SrBi_2Ta_2O_9$ Thin Films with Modified Sr Composition T. Hase;T. Noguchi;K. Takemura;Y. Miyasaka