A simulation study on vertical focusing in micro-tip FED

  • Lee, Chun-Gyioo (Flat Display Lab., Technology Center, Samsung Display Devices) ;
  • Jo, Sung-Ho (Flat Display Lab., Technology Center, Samsung Display Devices) ;
  • Ko, Tae-Young (Flat Display Lab., Technology Center, Samsung Display Devices) ;
  • Moon, Soo-Young (Flat Display Lab., Technology Center, Samsung Display Devices) ;
  • Yunsoo Choe (Flat Display Lab., Technology Center, Samsung Display Devices)
  • Published : 1999.04.01

Abstract

Electron beam trajectory simulation results on the high voltage FED with cone-type field emitters predict that the cross-talk phenomena would be seen due to the divergence of the electron beam. In this study, computer simulations with design of experiment technique and the SNU-FEAT program were carried out for five input parameters of the aperture focusing structure. The results tell that the focusing voltage is a dominant factor. And, the beam divergence index could be reduced to 10.7$\mu\textrm{m}$ with the aperture focusing structure, however, the operating voltage of the field emitter is predicted to increase by 40% maximum.

Keywords