Abstract
Amphiphilic monomer, N-octadecylacrylamide (N-ODA), having a long chain hydrophobic alkyl group and a hydrophilic amide group was synthesized from the reaction of acrylamide with 1-bromooctadecane in dimethylformamide (DMF) in the presence of KOH at room temperature for three hours. N-ODA monolayer was deposited on solid substrates, such as slide glass, KRS-5, and silicon wafer, by employing Langmuir-Blodgett (LB) technique, under the appropriate deposition condition. Complete polymerization of monomer LB films was achieved by UV-irradiation for 220 seconds. The polymerized LB films were not soluble in ethanol that is a good solvent for monomer LB films. Negative resist patterns were generated by irradiation of the masked N-ODA monomer LB films with UV light followed by dissolution of the unirradiated portions with ethanol.
