Journal of Photoscience

Korean Society of Photoscience (한국광과학회)
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Synthesis of Photobase Generators and Their Use for Design of Polymeric Photosensitive System

  • Tsunooka, Masahiro (Department of Applied Chemistry, Graduate School of Engineering) ;
  • Tachi, Hideki (Department of Applied Chemistry, Graduate School of Engineering) ;
  • Asakino, Kaori (Department of Applied Chemistry, Graduate School of Engineering) ;
  • Suyama, Kanji (Department of Applied Chemistry, Graduate School of Engineering)
  • Published : 1999.05.01
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Abstract

The use of O-carbamoyloximes as photobase generators was investigated. $\alpha$-Meth-ylbenzilydeneamino phenylcarbamate(2a) and $\alpha$-methyl benzilydeneamino cyclohexylcarbamate(2b) were prepared by the reaction of phenyl or cyclohexyl isocyanates with acetophenone oxime , respectively. Aniline, phenylhydrazine and N, N'-diphenylhydrazine were detected in thephotolysis of 2a and cyclohexylamine and cyclohexylhydrazine in the photolysis of 2b. A monomer having pendant carbamoyloxyimino groups (BGM) was prepared by the reaction fo methancryloyloxyethyl iocyanate with acetophenone oxime, and copolymerized with styrene. The BGM copolymer films turned insoluble on UV irradiation, and the degree of insolubilizationwas increased by post-baking. The photocrosslinking was thought to be due to coupling of resulting pendant aminyl radicals, and the thermal crosslinking was due to association of resulting amino and hydrazino groups by hydrogen bonding. The introduction of epoxy groups into polymer increased the degree of thermal crosslinking by post-baking.

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References

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