Crystalline structure and electrical properties of PbSe thin films prepared using PLD method

PLD 법으로 제작한 PbSe 박막의 결정구조와 전기적 특성

PbSe thin films were grown using PLD method on the p-Si(100) substrate. To determine what crystalline structure of PbSe thin films have according to the growth temperature, the films were prepared under a substrate temperature changing between a room temperature and $400^{\circ}C$. As a result of analyzing XRD patterns of PbSe thin films prepared at various substrate temperatures and FWHM of PbSe(200) rocking curve, it was found that PbSe thin film obtained at the growth temperature of $200^{\circ}C$ was best crystallized. In addition, the surface morphology of PbSe thin film observed using AFM found itself having the most regularly arranged particles in case of growing the film at $200^{\circ}C$. The measurement of Hall effect indicated that PbSe thin films were n-type semiconductors and that current-voltage characteristic curve exhibit the typical p-n junction phenomenon. In addition, electric conductivity of PbSe thin films was found somewhat higher than that of general semiconductors.

PLD 법을 이용하여 PbSe 박막을 p-Si(100) 기판 위에 성장시켰다. 성장온도에 따른 박막의 결정구조를 조사하기 위하여 기판온도를 RT${\sim}400^{\circ}C$로 변화시키면서 박막을 제작하였다. 여러 기판온도에서 제작한 PbSe 박막의 XRD 패턴과 PbSe(200) rocking curve의 반치폭(FWHM)을 분석한 결과, 성장온도 $200^{\circ}C$에서 제작한 박막이 가장 양호한 결정성을 나타냈다. 또한 AFM으로 관찰한 PbSe 박막의 표면형태도 $200^{\circ}C$에서 성장시킨 박막의 표면입자들이 가장 규칙적인 배열을 보였다. Hall 측정결과, PbSe 박막은 n-type 반도체임을 알 수 있었고, 전류-전압 특성 곡선은 전형적인 p-n junction 현상을 나타냈다. 또한 n-type 반도체인 PbSe 박막의 전기전도도는 일반적인 반도체의 값보다 약간 큰 것으로 확인되었다.