Acknowledgement
Supported by : 호서대학교
Clean Technology (청정기술)
- Volume 4 Issue 1
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- Pages.68-75
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- 1998
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- 1598-9712(pISSN)
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- 2288-0690(eISSN)
Development of environmentally sound technology for the wafer drying system
반도체 제조산업중 웨이퍼 건조공정의 청정기술 적용을 위한 연구
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Chang, In-Soung
(Dept. of Environmental Engineering, Hoseo University)
;
- Kim, Jae-Hyung (Super-Tech)
- Received : 1998.06.11
- Accepted : 19980931
- Published : 1998.06.01
Abstract
An innovative wafer drying system was developed using Isopropyl alcohol (IPA) and nitrogen carrier gas in order to replace the commercial conventional drying system which was a non-environmentally friendly system. This system was designed as following ; the IPA evaporation chamber and the process chamber were separated to increase drying efficiency, and the carrier gas with the IPA vapor was delivered into the process chamber. It was investigated that the IPA concentration was the most important factor to operate the system. The optimum concentration was found to be 2.4 ml IPA/N2 1. In addition, the optimum flow rate of the nitrogen gas were maintained more than 60 l/min.
반도체 소재인 웨이퍼의 세정공정중 마지막 단계인 건조공정을 환경친화적인 공정으로 개발하기 위한 연구를 수행하였다. IPA(Isopropyl Alcohol)를 기화시키는 증기발생실과 웨이퍼를 건조하는 공정실로 구분하여 시스템을 설계하고 이를 이용하여 건조실험을 실시하였다. 건조효율에 가장 큰 영향을 미치는 인자는 질소중의 IPA 농도로 나타났으며, 동일한 건조효율을 얻기 위해서 IPA의 사용량이 기존건조기보다 적은 것으로 나타났으며, 웨이퍼 표면이 수분과 산소로부터 차단되기 때문에 생산되는 웨이퍼의 입자오염이 감소하는 결과를 나타냈다.
Keywords