Analytical Science and Technology (분석과학)
- Volume 11 Issue 6
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- Pages.1065-1074
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- 1998
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- 1225-0163(pISSN)
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- 2288-8985(eISSN)
Characterization of Semiconductor Using Neutron Activation Analysis-II - Manufacturing Process and Surface Depth Profile Analysis -
중성자 방사화분석법에 의한 반도체 특성조사-II - 반도체 제조공정 및 표면 적층분석 -
- Kim, Nak Bae (Analysis Research Division, Korea Institute of Geology, Mining and Materials)
- 김낙배 (한국자원연구소 분석연구부)
- Published : 1998.12.25
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