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Molecular Orbital Studies of Bonding Characters of Al-N, Al-C, and N-C Bonds in Organometallic Precursors to AIN Thin Films

  • Published : 1998.12.20

Abstract

Electronic structures and properties of the organometallic precursors [Me2AlNHR]2 (R =Me, iPr, and tBu) have been calculated by the semiempirical (ASED-MO, MNDO, AM1 and PM3) methods. Optimized structures obtained from the MNDO, AM1, and PM3 calculations indicate that the N-C bond lengths are considerably affected by the change of the R groups bonded to nitrogen, but the bond lengths of the Al-N and Al-C bonds are little affected. This result is useful in explaining the experimental results for the elimination of the R groups bonded to nitrogen, and could serve as a guide in designing an optimum precursor for the AlN thin film formation.

Keywords

References

  1. IEEE Trans. On Components, Hybrids, and Manufacturing Tech. CHMT. v.8 Kurokawa, Y.;Utsumi, K.;Takamizawa, H.;Kamata, T.;Noguchi, S.
  2. CRC Handbook of Chemistry and Physics, $59^{th}$ West, R.C.(ed.)
  3. Appl. Phys. Lett. v.33 Perry, P.B.;Rutz, R.F.
  4. J. Appl. Phys. v.44 Yim, W.M.;Stofko, E.J.;Zanzucchi, P.J.;Pankove, J.I.;Ettenberg, M.;Gilbert, S.L.
  5. Surface Sci. v.178 Gautier, M.;Duraud, J.P.;Le Gressus, C.
  6. Thin Solid Films v.139 Li, X.;Zuchuan, X.;Ziyou, H.;Huazhe, C.;Wuda, S.;Zhongcal, C.;Feng, Z.;Enguang, W.
  7. Phys. Rev. v.B24 Gabe, E.;Le Page, Y.
  8. Phys. Rev. v.B28 Kobayashi, A.;Sankey, O.F.;Volz, S.M.;Dow, J.D.
  9. Solid State Commun. v.56 Olson, C.G.;Sexton, J.H.;Kynch, D.W.;Bevolo, A.J.;Shanks, H.R.;Harmon, B.N.;Ching, W.Y.;Wieliczka, D.M.
  10. Surface Sci. v.218 Awad, M.K.;Anderson, A.B.
  11. Chem. Mater. v.3 Mayer, T.M.;Rogers, J.W.;Michalske, T.A.
  12. Chem. Mater. v.3 Bartram, M.E.;Michalcke, T.A.;Rogers, J.W.;Mayer, T.M.
  13. J. Cryst. Growth. v.77 Gaskill, D.K.;Bottka, N.;Lin, M.C.
  14. Chem. Mater. v.3 Zanella, P.;Rosseto, G.;Brianese, N.;Ossola, F.;Prochia, M.;Williams, J.O.
  15. J. Cryst. Growth. v.107 Ho, K.L.;Jensen, K.F.
  16. J. Chem. Soc., Dalton Trans. Bowen, R.E.;Gosling, K.
  17. J. Chem. Soc., Dalton Trans. Amirkhalili, S.;Hitchcock, P.B.;Smith, J.D.
  18. J. Chem. Soc., Dalton Trans. Amirkhalili, S.;Hitchcock, P.B.;Jenkins, A.D.;Nyathi, J.Z.;Smith, J.D.
  19. J. Chem. Soc., Dalton Trans. Al-Wassil, A.A.I.;Hitchcock, P.B.;Sarisaban, S.;Smith, J.D.;Wilson, C.L.
  20. The Chemistry of Inorganic Homo- and Heterocycles(Vol. 1) Haiduc, I.;Sowerby, D.B.
  21. Inorg. Chem. v.29 Sauls, F.C.;Interrante, L.V.;Jiang, Z.
  22. Mat. Res. Soc. Symp. Proc. v.73 Interrante, L.V.;Carpemter Ⅱ, L.E.;Whitmarsh, C.;Lee, W.;Garbauskas, M.;Slack, G.A.
  23. J. Electrochem. Soc. v.136 Interrante, L.V.;Lee, W.;McConnell, M.;Lewis, N.;Hall, E.
  24. Chem. Mater. v.1 Boyd, D.C.;Haasch, R.T.;Mantell, D.R.;Schulze, R.K.;Evans, J.F.;Glasfelter, W.T.
  25. Bull. Korean Chem. Soc. v.14 Park, J.T.;Lee, J.K.;Kim, S.;Sung, M.M.;Kim, Y.
  26. Jpn. J. Appl. Phys. v.34 Park, S.M.;Boo, B.H.;Kim, Y.;Park, J.T.;Koyano, I.
  27. Bull. Korean Chem. Soc. v.15 Sung, M.M.;Jung, H.D.;Lee, J.K.;Kim, S.;Park, J.T.;Kim, Y.
  28. J. Chem. Phys. v.62 Anderson, A.B.
  29. Inorg. Chem. v.30 Brock, C.P.;Companion, A.L.;Kock, L.D.;Niedenzu, K.
  30. J. Phys, Chem. v.91 Anderson, A.B.;Grimes, R.W.;Hong, S.Y.
  31. Surface Sci. v.194 Chu, S.Y.;Anderson, A.B.
  32. Phys. Rev. v.B8 Anderson, A.B.
  33. Xurface Sci. v.247 Ling, Y.;Xide, X.
  34. MOPAC'93 J.J.P. Stewart
  35. Bull. Korean Chem. Soc. v.17 Park, J.T.;Oh, W.T.;Kim, Y.