A Study on The Optimal Operation and Malfunction Detection of Plasma Etching Utilizing Neural Network

신경회로망을 이용한 플라즈마 식각공정의 최적운영과 이상검출에 관한 연구

The purpose of this study is to provide an integrated process control system for plasma etching. The control system is designed to employ neural network for the modeling of plasma etching process and to utilize genetic algorithm to search for the appropriate selection of control input variables, and to provide a control chart to maintain the process output within a desired range in the real plasma etching process. The target equipment is the one operating in DRAM production lines. The result shows that the integrated system developed is practical value in the improved performance of plasma etching process.