Journal of the Korean Institute of Telematics and Electronics D (전자공학회논문지D)
- Volume 35D Issue 9
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- Pages.42-47
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- 1998
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- 1226-5845(pISSN)
Nano-scale pattern delineation by fabrication of electron-optical lens for micro E-beam system
마이크로 전자빔 시스템을 위한 전자광학렌즈의 제작에 의한 나노 패턴 형성
- Lee, Yong-Jae (Inter-university Semiconductor Research Center(ISRC) and School of Electrical Engineering, Seoul National University) ;
- Park, Jung-Yeong (Dept. of Physics, Seoul National University) ;
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Chun, Kuk-Jin
(Inter-university Semiconductor Research Center(ISRC) and School of Electrical Engineering, Seoul National University) ;
- Kuk, Young (Dept. of Physics, Seoul National University)
- Published : 1998.09.01
Abstract
We have fabricated electron-optical lens for micro E-beam system that can overcome the limitation of current E-beam lithography. Our electron-optical lens consists of multiple silicon electrodes which were fabricated by micromachining technology and assembled by anodic bonding. The assembled system was installed in UHV chamber to observe the emission characteristics of focused electrons by the electro-optical lens. We used STM(Scanning Tunneling Microscope) tip for electron source. By performing lithography with the focused electrons with PMMA(poly-methylmethacrylate) as E-beam resist. We could draw 0.13
현재의 전자빔 묘화의 한계를 극복할 수 있는 마이크로 전자빔 시스템의 전자 광학 렌즈를 제작하였고 전자빔 묘화실험을 통하여 이를 검증하였다. 마이크로머시닝기술을 이용하여 실리콘 전극을 제작하고 이를 양극 접합을 통해 조립하여 다층 전극의 전자 광학 렌즈를 제작하였다. 완성된 전자 광학 소자를 초고진공 챔버에 장착하여, STM(Scanning Tunneling Microscope) 팁에서 방출된 전자빔의 focusing 특성을 관찰하였으며 전자를 집속하여 리소그라피를 수행하였다. E-beam 감광막은 PMMA(Poly-methylmethacrylate)를 사용하였고 0.13㎛의 패턴을 형성시킬 수 있었다.
Keywords