Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 31 Issue 4
- /
- Pages.217-222
- /
- 1998
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
Crystal Orientation of Thin Films Prepared by Facing Targets Sputtering
대향타겟스퍼터링으로 제작된 박막의 결정 배향성
Abstract
The Facing Targets Sputtering(FTS) system has several advantages for preparing films over a wide range of working gas pressure on plasma-free substrates. Co-Cr thin films seem to be one of the most promising media for perpendicular magnetic recording system. In this study, the capabillities of the system fordepositing C0-Cr films have been investigated. Under various Ar gas pressure, films with morphologically dense microstructure and good c-axis orientation were deposited, even when the incident angle
Keywords