Abstract
Crystallinity and structual properties of the epitaxially grown Pt films on $Al_2O_3$(0001) substrate by rf magnetron sputtering at a substrate temperature of $600^{\circ}C$ were studied by using backscattering spectrometry (BS)/channeling and transmission electron microscopy (TEM) measurements. $MeV^4$He ion BS/channeling results showed that the channeling minimum yield of Pt film with a thickness of 3500$\AA$ was 4%. This indicates an excellent crystallinity of Pt film. When the thickness of Pt film was less than 200 $\AA$, the channeling minimum yield of Pt film increased sharply with the decrease in film thickness. The Pt layer on $Al_2O_3$(0001) substrate grew epitaxially to the direction of (111) with six-fold symmetry. Cross-sectional TEM images also showed that Pt film on $Al_2O_3$(0001) substrate consist of twinned domains to release the strain induced by the lattice mismatch and the surface roughness of the film increased at the twin boundaries where the strain was contcentrated.
rf magnetron sputtering 증착법으로 Al2O3(0001)기판위에 적층생장시킨 Pt박막의 결정성 및 이의 구조적 특성을 backscattering spectrometry(BS)/channeling, transmission electron microscopy(TEM)등을 이용해 분석하였다. $MeV^4$He ion channeling 결과, 증착시 기판의 온도가 $600^{\circ}C$, 증착된 Pt층의 두께가 3500$\AA$이었을 때 최소산란수율(channeling minimum yield)이 4%인 결정성이 우수한 Pt박막이 생장되었음을 확인하였으며, 동일한 증 착조건하에서 증착된 Pt층은 $Al_2O_3$(0001)기판위에 6중 대칭구조를 지닌(111)면방향으로 적층 생장되었으며, (111)면방향을 중심으로 대칭적인 원자배열 구조를 갖고 있는 쌍정구조를 형 성하고 있었다. 단면 TEM 분석결과에서도 격자부정합에 의한 strain을 감소시키기 위하여 형성된 쌍정을 관찰할 수 있었으며 strain이 집중되는 쌍정경계면에서 표면거칠기의 증가 또는 관찰되었다.
