Characteristics of ZnO/Glass Thin Films Prepared by RF Magnetron Sputtering

RF 마그네트론 반응성 스퍼터링 제작된 ZnO/Glass 박막 특성

  • Published : 1998.10.01

Abstract

ZnO thin films on glass substrate were deposited by on RF mangetron reaction sputter with various grgon/oxygen gas ratios and sbustrate temperatures. Crystallinities, surface morphologies, chemical compositions, and electrical properties of the films were investigated by XRD, AFM, XPS, RBS, and electrometer(keithley 617). All films showed a strong perferred orientation along the x-axis on glass substrate, and the chemical stoichiometry of Zn/)=1/1.0 was obtained at Ar/$O_2$ =50/50. Surface roughness and resistivity depended on the argon/oxygen gas ratio. The minimum surface roughness of 20$\AA$ and maximum resistivity of $10^8$ $\Omega$ cm were achieved at Ar/$O_2$=10/90.

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References

  1. Sensors and Actuators. v.A21-A23 F. R. Boom;D. J. Yntema;F. C. M. Van De Pol;M. Elwenspoek;J. H. J. Fluitman;Th. J. A. Popma
  2. Proc. IEEE. no.66 H. Sato;T. Maguro;K. Yamanouchi;K. Shibayama
  3. J. Electrochem. Soc. v.136 no.7 S. Pizzini;N. Butta;D. Narducci;M. Palladino
  4. J. Appl. Phys. v.69 no.4 Yasuhiro Igasaki;Hiromi Saito
  5. J. Appl. Phys. v.55 H. Nanto;T. Minami;S. Shooii;S.Takata
  6. J. mater. Res. v.11 R. Wang;L. L. H. King;Arthur W. Sleight
  7. J. Appl. Phys. no.73 Syuichi Takada
  8. J. Vac. Sci. Tech. no.16 J. Aranovich;A. Armono;R. Bube
  9. Appl. Phys. Lett. v.37 no.5 Sorab K. Ghandhi;Robert J. Field;James R. Shealy
  10. J. Mat. Sci. v.22 M. J. Brett;R. R. Parsons
  11. 한국요업학회지 v.34 no.12 김병진;조남희
  12. J. Electrochem. soc. no.7 J. O. Barens;D. J. Leary;A. G. jordan
  13. J. Appl. Phys. v.49 no.5 S. Maniv;A. Zangvil
  14. IEEE Trans. Sonics and Ultrason. no.18 J. D. larson;D. K. Winslow;L. T. Zitelli
  15. 電子通信學會技術會報 v.us 73 M. Minakata;N. Chabachi;Y. Kikuchi
  16. Surf. Inter face. Anal. v.18 S. Hashimoto;K. Hirokawa;Y. Fukuda;K. Suzuki;N. Usaki;M. Koda
  17. Mat. Scie. Eng. no.A115 R. Kelly
  18. J. Vac. Sci. Tech. v.9 J. Vuillod
  19. J. Appl. Phys. no.66 R. E. I. Schropp;A. Madan
  20. J. Appl. Phys. no.74 Fabio. Quarante;Antonio. Valentini;Federica. Rizzi;Giuseppe. Gasamassima
  21. Thin solid Films. v.150 N. Croitoru;A. Seidmann;K. Yassin