한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제11권10호
  • /
  • Pages.809-814
  • /
  • 1998
  • /
  • 1226-7945(pISSN)
  • /
  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

마이크로웨이브 플라즈마 화학기상성장법에 의한 다이아몬드 박막의 합성에 관한 연구

A Study on the Diamond Thin Films Synthesized by Microwave Plasma Enhance Chemical Vapor Deposition

  • 이병수 (인하대학교 공대 전기공학과) ;
  • 이상희 (인하대학교 공대 전기공학과) ;
  • 박상현 (경남대학교 공대 전기고학과) ;
  • 유동현 (안산공업전문대학) ;
  • 이백수 (인하대학교 공대 전기공학과) ;
  • 이덕출 (안산공업전문대학 전기과)
  • 발행 : 1998.10.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

In this study, the metastable state diamond thin films have been deposited on Si substrates from methand-hydrogen and oxygen mixture usin gMicrowave Plasma Enhanced Chemical Vapor Deposition (MWPCVD) method. effects experimental parameters MWPCVD including methan concentrations, oxygen additions, operating pressure, deposition time on the growth rate and crystallinity were investigated. diamond thin film was synthesized under the following conditions: methane concentration of 0.5%(0.5sccm)∼5%(5sccm). oxygen concentration of 0∼80%(2.4sccm). operating pressure of 30Torr∼ 70Torr, deposition time of 1∼32hr. SEM, WRD, and Raman spectroscopy were employed to analyse the growth rate and morphology, crystallinity and prefered growth direction, and relative amounts of diamond and non=diamond phases respectively.

키워드

참고문헌

  1. J. Am. Ceram. Soc. v.72 no.2 Diamond-Ceramic Coating of Future K. E. Spear
  2. Nature v.176 Man-Made Diamond F. P. Bundy;H. T. Hall;H. M. Strong;R. H. Wentorf, Jr.
  3. J. Crystal Growth. no.52 Vapor growth of diamond on diamond and other surface B. V. Spitsyn;L. L. Bouilov;B. V. Derjaguin
  4. Jpn. J. Appl. Phys. v.21 no.4 Vapor Deposition of diamond Particle from Methane S. Matsumoto;Y. Sato;M. Kamo;N. Setaka
  5. J. Vac. Sci. Technol., A v.2 no.2 S. Aisenberg
  6. J. Vac. Sci. Technol. v.21 no.3 B. A. Blanks;S. K. Rutledge
  7. J. Vac. Sci. Technol., A v.5 no.6 H. C. Tsai;D. B. Bogy
  8. J. Appl. Phys. v.72 no.2 K. Tankala;T. Debroy
  9. J. Mater. Sci. v.23 Y. Saito;K. Sato;H. Tannka;K. Fujita;S. Matsuda
  10. Philips Res. Reports. no.22 A. Van der Drift
  11. J. Cryst. Growth. A. Okawa