A Study on the Electrical Characteristics of Optical Memory PLZT Thin Films

Sol-Gel법으로 제작된 광메모리영역 PLZT박막의 전기적 특성

  • 최형욱 (경원대학교 전기전자 공학부) ;
  • 장낙원 (연세대학교 전기공학과) ;
  • 백동수 (연세대학교 전기공학과) ;
  • 박정흠 (연세대학교 전기공학과) ;
  • 박창엽 (연세대학교 전기공학과)
  • Published : 1998.01.01

Abstract

In this study, PLZT stock solutions were prepared by Sol-Gel processing after the compositions were selected in the memory region of PLZT bulk phase diagram. PLZT solutions were deposited on the ITO glass substrate by spin-coating method. The thin films were annealed by rapid thermal processing. The electric characteristics, hysteresis loop, C-V characteristics of thin films in the memory region were measured in order to investigate the electrical characteristics of PLZT thin films. In selected compositions the decrease in Zr/Ti ratio led to an increase in dielectric constant and the decrease in remanent polarization and coercieve field which brought about slim hysteresis loop.

Keywords

References

  1. Journal of the American Ceramic Society v.54 G. Haertling;C. E. Land
  2. Ferroelectrics v.75 G. H. Haertling
  3. J. Appl. Phys. v.72 no.4 M. Klee;R. Eusemann;R. Waser;W. Brand
  4. Journal of Non-Crystalline Solids v.147 N. J. Phillips;S. J. Milne
  5. Ferroelectrics v.116 Gene H. Haertling
  6. Ferroelectrics v.93 R. W. Vest;J. Xu
  7. Integrated Ferroelectrics v.4 G. Teowee;J. M. Boulton
  8. The Fall Symposium of The Korean Institute of Electrical Engineers Woon-Haing Hur;Chang-Yub Park
  9. Journal of Electronic Material v.21 no.10 D. F. Ryder;N. K. Raman