Study on the Surface Magnetic Domain Structure of Thin-Gauged 3% Si-Fe Strips using Scanning Electron Microscopy with Polarization Analysis

  • Chai, K.H. (Division of Metals, Korea Institute of Science and Technology) ;
  • Heo, N.-H. (Materials and Corrosion Laboratory, Korea Electric Power Research Institute) ;
  • Na, J.g. (Division of Metals, Korea Institute of Science and Technology) ;
  • Lee, S.R. (Department of Metallurginal Engineering Korea University) ;
  • Woo, j.s. (POSCO Technical Research Laboratories)
  • Published : 1998.06.01

Abstract

Scanning Electron Microscopy with Polarization Analysis (SEMPA) was used to image the surface magnetic domain structure of the 100 ${\mu}{\textrm}{m}$ thick 3% Si-Fe sheet. The thin-gauged 3% Si-Fe strips with magnetic induction ($B_{10}$) from 1.98 to 1.57 Tesla were prepared via conventional metallurgical processes including melting, hot-and cold-rolling, intermediate annealing and final annealing. Using SEMPA, it was observed that the $B_{10}$ (1.98 T) Tesla sample was almost composed of 180$^{\circ}$ stripe domains which are parallel to rolling direction. On the other hand the 3% Si-Fe sheet with $B_{10}$ (1.57 T) Tesla was composed of large 180$^{\circ}$stripe domains that are slanted about 30$^{\circ}$to the rolling direction and complex magnetic domain structures like tree and zigzag pattern. The 180$^{\circ}$stripe domains, which covered a major part of the sample, had (110)<001> Goss texture parallel to the rolling direction. The domain walls between 180$^{\circ}$stripe domains were the conventional Bloch type walls. On the other hand, the 90$^{\circ}$domains, which covered minor part on edge of the sample, were observed in (200) grains. The domain walls between 90$^{\circ}$domains were the Neel type walls. In high magnification, the elliptical singularity at the Neel walls was clearly observed.

Keywords

References

  1. IEEE Trans. v.Mag-10 J. W. Shilling;G. L. Houze
  2. J. Appl. Phys. v.55 A. L. Von Holle;J. W. Schoen
  3. J. Appl. Phys. v.55 E.T. Stephenson
  4. Trans. AIME v.215 J. L. Walter;C.G. Dunn
  5. J. Appl. Phys. v.83 N. H. Heo;K. H. Chai;J. G. Na
  6. Scripta Mater. N. H. Heo;K.H. Chai;J. G. Na;J. S. Woo
  7. Rev. Sci. Instrum. v.61 M. R. Scheinfein;J. Unguris;M. H. Kelly;D. T. Pierce;R. J. Cellota
  8. Scripta Mater. N. H. Heo;Y. J. Kim;J. G. Na
  9. Scripta Mater. Y. Lee;A. R. Koymen;N. H. Heo;J. G. Na;J. S. Woo
  10. Phy. Rev. v.75 H. J. Williams;R. M. Bozoth;W. Shockly