한국세라믹학회지 (Journal of the Korean Ceramic Society)

  • 제35권1호
  • /
  • Pages.17-22
  • /
  • 1998
  • /
  • 1229-7801(pISSN)
  • /
  • 2234-0491(eISSN)
한국세라믹학회 (The Korean Ceramic Society)
권호 표지

RF 마그네트론 스퍼터링법으로 증착한 B-doped ZnO 박막의 전기 및 광학적 특징

Electrical and Optical properties of B-doped ZnO films Deposited by RF Magnetron Sputtiering

  • 임주수 (울산대학교 공과대학 재료금속공학부) ;
  • 이재신 (울산대학교 공과대학 재료금속공학부)
  • 발행 : 1998.01.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

B-doped ZnO thin films on glass substrates were prepared by sputtering the ceramic targets which had been prepared by sintering disks consisting of ZnO and various amounts of B2O3 While pure ZnO films show-ed a c-axis oriented growth the B-doping retarded the prefered orientation and grain growth of the film. Electron concentrations for undoped and B-doped ZnO films were on the order of 7.8${\times}$1018 cm-3 and 5${\times}${{{{ {10 }^{20 } }} c{{{{ {m }^{-3 } }} respectively. The electron mobility however decreased with the B-doping concentration. Optical meas-urements on the films showed that the average transmittance in the visible range was higher than 85% The measurements also indicated a blueshift of the absorption edge with doping.

키워드

참고문헌

  1. J. Appl. Phys. v.62 Degradation of Tin-Doped Indium Oxide Film in Hydrogen and Argon Plasma R. Banerjee;S. Ray;N. Basu;A K Batabyal;A.K.Barua
  2. Jpn. J. Appl. Phys. v.20 Degradation of ITO Film in Glow-Discharge Plasma O. Kuboi
  3. Mat. Res. Soc. Proc. v.426 Technological Development for Commercialization of Amorphous Silicon Based Multijunction Modules L. Yang;M. Benett;L. Chen;K. Jansen;J. Kessler;Y. Li;J. Newton;K. Rajan;F. Willing;R. Arya;D. Carlson;D. Ginley(ed.);A Catalano(ed.);H.W.Schock(ed.);C. Eberspacher(ed.);T.M.Peterson(ed.);T. Wada(ed.)
  4. Proc. 1994 First World Conf. Photovoltaic Energy Conversion High Efficiency a-Si Solar Cells with ZnO Films W.W. Wenas;K. Dairiki;A. Yamada;M. Konagai;K. Dakahashi;J.H. Jang;K.S. Lim
  5. Tech. Dig. Int. PVSEC-9 Large Area ZnO Films Optimized for Graded Band-gap Cu(In,Ga)Se₂-based Thin Mini-modules N.F Cooray;K. Kushiya;A. Fujimaki;I. Sugiyama;T. Miura;D. Okumura;M. Sato;M. Ooshita;O. Yamase
  6. J. Mater. Res. v.11 no.7 Highly Conducting Transparent Thin Films Based on Zinc Oxide R.Wang;L L H King;A.W. Sleight
  7. J Kor. Cer. Soc. v.33 no.2 솔-젤법에 의한 Al-doped ZnO 투명전도막의 제조 및 특성 현승민;홍권;김병호
  8. Kor. J. Mater. Res. v.5 no.3 RF 마그네트론 스퍼트링법으로 증착한 Al이 첨가된 ZnO 투명전극막의 전기적 특성 김진용;이용의;조해석;이동헌;김영진;김형준
  9. Jpn. J Appl Phys. v.31 no.8A Large-Area Milky Transparent Conducting Al-doped ZnO Films Prepared by Magnetron Sputtering T Minami;H. Sato;S. Takata;N Ogawa;T. Mouri
  10. Jpn. J. Appl. phys. v.23 no.5 Highly Conducting and Transparent Al-doped ZnO Thin Films Prepared by RF Magnetron Sputtering T. Minami;H Nanto;S. Takata
  11. J Appl Phys. v.71 no.2 Textured Al-doped ZnO Thin Films From Atmospheric Pressure Chemical-Vapor Deposition J Hu;Roy G. Gordon
  12. J. Kor. Cer. Soc. v.32 no.7 직류 Magnetron Sputter 법으로 제작된 ZnO:Al 박막의 전기광학 특성 김의수;유세웅;유병석;이정훈
  13. J. Kor. Asso Crys Growth v.6 no.4 반응성 Sputtering법으로 제작된 ZnO:Al 박막의 전기광학적 특성에 미치는 열처리의 영향 유세웅;유병석;이정훈
  14. Jpn. J. Appl. Phys v.31 no.3A Low Subtrate Temperature Deposition of Transparent Conducting Al-doped ZnO Thin Films Prepared by Magnetron Sputtering T. Minami;H. Sato;H. Imamoto;S. Takata
  15. J. Am. Cer. Soc. v.73 no.5 Electrical Properties of Gallium-doped ZnO Films Prepared by RF Sputtering B.H. Choi;H B. IM.
  16. Thin Solid Films v.193 Optical and Electrical Properties of Ga₂O₃-doped ZnO Films Prepared by RF Sputtering B. H Choi;H. B. IM.
  17. Kor. J. Mater. Res. v.5 no.5 플라즈마 화학기상 증착법에 의한 B이 첨가된 ZnO 박막의 증착에 관한 연구 최준영;조해석;김영진;이용의;김형준
  18. The Electrical Characterization of Semiconductors:Majority Carriers and Electron States N. H. March
  19. Polycrystalline and Amorphous Thin Films and Devices L L Kazmerski
  20. Optical Processes in Semiconductors J. I. Pankove
  21. Phys. Rev. v.93 Anormalous Optical Absorption Limit in InSb E. Burnstein