DOI QR코드

DOI QR Code

Microstructure and Third Order Optical Nonlinearities of Ion-Implanted and Thermally Annealed $Cu-SiO_2$ Thin Films

  • 발행 : 1997.08.20

초록

The crystal structure and optical properties of copper nanoparticles, prepared in fused silica by ion-implantation and subsequent heat-treatment, were characterized by X-ray, TEM, linear absorption, and degenerate four-wave mixing (DFWM) technique. The X-ray data show fcc lattice structure of the nanocrystals and their size was measured as 8-20 nanometer by high resolution TEM. Using DFWM, the third-order nonlinear optical coefficient of the Cu-SiO2 thin films was measured as 0.4-1.1×10-8 esu in the surface plasmon resonance absorption region (540-570 nm).

키워드

참고문헌

  1. Optical Properties of Metal Clusters Kreibig, U.;Vollmer, M.
  2. Surf. Sci. v.156 Kreibig, U.;Genzel, L.
  3. J. Chem. Soc. Faraday Trans. v.87 Creighton, J. A.;Eadon, D. G.
  4. J. Chem. Phys. v.82 Heilweil, E. J.;Hochstrasser, R. M.
  5. J. Phys. Chem. v.94 Dutton, T.;Vanwonterghem, B.;Saltiel, S.;Chestnoy, N. V.;Renzepis, P. M.;Shem, T. P.;Rogovin, D.
  6. J. Phys. Chem. v.97 Henglein, A.
  7. Appl. Phys. A v.47 Hache, F.;Ricard, D.;Flyzanis, C.;Kreibig, U.
  8. Chem. Mater. v.5 Kozuka, H.;Sakka, S.
  9. J. Cer. Soc. Japan v.101 Matsuoka, J.;Mizutani, R.;Kaneko, S.;Nasu, H.;Kamiya, K.;Kadono, K.;Sakaguchi, T.;Miya, M.
  10. Chem. Mater. v.5 Gacoin, T.;Chaput, F.;Boilot, J. P.;Jaskierowicz, G.
  11. J. Non-Crystalline Solids v.211 Lee, M.;Kim, T. S.;Choi, Y. S.
  12. Mucl. Instr. Methods v.B59 no.60 Magruder Ⅲ, R. H.;Zuhr, R. A.;Weeks, R. A.
  13. J. Opt. Soc. Am. B v.11 Yang, L.;Becker, K.;Smith, F. M.;Magruder Ⅲ, R. H.;Haglund, Jr.R. F.;Yang, L.;Dorsinville, R.;Alfano, R. R.;Zuhr, R. A.
  14. J. Appl. Phys. v.46 Arnold, G. W.
  15. J. Lumin. v.53 Nakamura, A.;Tokizaki, T.;Akiyama, H.;Kataoka, T.
  16. Bull. Korean Chem. Soc. v.16 Lee, M.
  17. Phys. Rep. v.78 Perenboom, J. A. A.;Wyder, P. F.
  18. Phys. Rev. B v.6 Johnson, P. B.;Chresty, R. W.
  19. J. Opt. Soc. Am. B v.11 Uchida, K.;Kaneko, S.;Omi, S.;Hata, C.;Tanji, H.;Asahara, Y.;Ikushima, A.;Tokizaki, T.;Nakamura, A.
  20. J. Phys. Chem. v.95 Cui, Y.;Zhaox, M.;He, G. S.;Prasad, P. N.