Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Microstructure and Third Order Optical Nonlinearities of Ion-Implanted and Thermally Annealed $Cu-SiO_2$ Thin Films

  • Published : 1997.08.20
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Abstract

The crystal structure and optical properties of copper nanoparticles, prepared in fused silica by ion-implantation and subsequent heat-treatment, were characterized by X-ray, TEM, linear absorption, and degenerate four-wave mixing (DFWM) technique. The X-ray data show fcc lattice structure of the nanocrystals and their size was measured as 8-20 nanometer by high resolution TEM. Using DFWM, the third-order nonlinear optical coefficient of the Cu-SiO2 thin films was measured as 0.4-1.1×10-8 esu in the surface plasmon resonance absorption region (540-570 nm).

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