한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제30권4호
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- Pages.248-254
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- 1997
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
내황화성 비정질 Nb-Ni-Al-Si 코팅층의 개발
Development of Sulfidation Resistant Amorphous Nb-Ni-Al-Si Coating Layer
초록
The sulfidation behavior of a sputter-deposited amorphous coating of 69.0%Nb-16.9Ni-11.9%Al-2.2%Si (at.%) has been investigated as a funtion of temperature.(973-1173K) in pure sulfur pressure of 0.01atm. The sulfidation kinetics of the casting obyed the parabolic rate low over the whole temperature ranges studied. The stlfidation rate increased with the temperature, as expected. The sulfide scale, the composition of which was
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