Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 30 Issue 2
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- Pages.121-127
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- 1997
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Electrochemical Behavior of Vanadium Trungsten Oxide Thin Films Deposited by Sputtering
스퍼터링으로 증착한 바나듐 텅스텐 산화물 박막의 전기화학적 거동
Abstract
Vanadium tungsten oxide thin films were formed by RF magnetron sputtering and the effects of tungsten addition on the crystallinity and on the electrochemical behavior were investigated. X-ray analysis revealed that amorphized films could be obtained by tungase addition. In order to investigate the electrochemical behavior of the vanadium tungsten oxide films, electrochemical insertion and extraction of lithium were out in 1m
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