Structural and Optical Properties of TiO$_2$ Films Deposited by MOCVD

MOCVD 법에 의해 증착된 TiO$_2$ 박막의 결정구조 및 광학적 특성

  • 장동훈 (인하대학교 전자재료공학과) ;
  • 강성준 (인하대학교 전자재료공학과) ;
  • 윤영섭 (인하대학교 전자재료공학과)
  • Published : 1997.06.01

Abstract

TiO$_{2}$ tin films have been grown by MOCVD and their cahracteristics of crystallization and microstructures ahve been invetigated. Envelope mehtods are applied to the analysis of the transmission spectra to obtain the optical constants such as refractive indices and extinction coefficients for the TiO$_{2}$ thin films. The envelope methods are proved to be accurate by simulatin gthe transmission spectra. TiO$_{2}$ thin films start to crystallize at 350.deg.C and then crystallize fully into anatase phase at 400.deg.C or higher temperatures. Activation energies are obtained by plotting the deposition rate with varying the substrate temperature. It is 17.8 kcal/mol for the reaction limited regions. The refractive index and the extinction coefficient of the TiO$_{2}$ thin film at .gamma.=632.8 nm increases from 2.19 to 2.32 and decreases from 0.021 to 0.007, respectively, as the substrate temperature increases from 400 to 600.deg. C.

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