Journal of Radiation Protection and Research
- 제22권3호
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- Pages.135-141
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- 1997
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- 2508-1888(pISSN)
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- 2466-2461(eISSN)
LiF:Mg,Cu,Na,Si Teflon TLD의 열처리 특성
Anneal Characteristics of LiF:Mg,Cu,Na,Si Teflon TLDs
- Nam, Young-Mi (Pusan National University) ;
- Chung, Woon-Hyuk (Pusan National University) ;
- Lee, Dae-Won (Pusan National University) ;
- Kim, Hyun-Ja (Taejon Medical Junior College) ;
- Kim, Gi-Dong (Korea Institute of Geology, Mining and Materials)
- 발행 : 1997.09.30
초록
열처리 특성의 연구는 열형광선량계를 재 사용하는데 있어서 중요하다. 최근 개발된 디스크 형태 (직경 4.5 mm, 두께 약
The study of anneal characteristics is important for TL dosimeter to reuse. To obtain the annealing condition of the recently developed, new TL dosimeter, LiF:Mg,Cu,Na,Si Teflon Tills in a disk type (diameter 4.5 mm, thickness about
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