Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 29 Issue 6
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- Pages.834-838
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- 1996
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
PLASMA DIAGNOSIS OF FANING TARGETS SPUTTERING SYSTEM FOR DEPOSITION OF BA FERRITE FILMS IN Ar, Xe AND $O_2$ GAS MIXTURE
- Matsushita, Nobuhiro (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
- Noma, Kenji (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
- Nakagawa, Shigeki (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
- Naoe, Masahiko (Dept. of Physical Electronics, Tokyo Institute of Technology)
- Published : 1996.12.01
Abstract
The diagnosis of the plasma in the facing targets sputtering system was performed in mixture gas of Ar 0.18-0.0 Pa, Xe 0.0-0.18 Pa and
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