Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 29 Issue 6
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- Pages.644-647
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- 1996
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
IMPROVEMENT OF DISTRIBUTION OF COERCIVITY IN CO-CR FILMS DEPOSSSITED BY FACING TARGETS SPUTTERING
- Takayama, Seiryu (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
- Nakagawa, Shigeki (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
- Kim, Kyung-Hwan (Dept. of Electrical Electronics, Kyung Won University) ;
- Naoe, Masahiko (Dept. of Physical Electronics, Tokyo Institute of Technology)
- Published : 1996.12.01
Abstract
The distribution of coercivity in the thickness direction were investigated by using Kerr hysteresis loop tracer for the Co-Cr films deposited by Facing Targets Sputtering apparatus. It was found that the difference between the coercivities of surface layer and initial growth layer H
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