참고문헌
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- Jpn. J. Appl. Phy. v.34 no.2A Effect of SCI process on Silicon Surface Microroughness and Oxide Breakdown Characteristics K. Akiyama,;N. Naito,;M. Nagamori,;H. Koya,;E. Morita,;K. Sassa,;H. Suga
- Tech. Dig. of IEDM Thin Oxide Reliability C. Hu
- Proc. Int. Symp. Testing and Failure Analysis The Use of Light Emission in Failure Analysis of CMOS ICs C.F. Hawkins,;J.M. Sonde,;E.I. Code Jr,;E.S. Snyder
- Jpn. J. Appl. Phys. v.28 no.12 Degradation of Gare Oxide Intergrity by Metal Impourity K. Hiyamoto,;M. Sano,;S. Sadamitsu,;N. Fujino