Dependences of $PbTiO_3$ Thin Films on Ti Bath Temperature and Deposition Temperature

MOCVD법에 의한 $PbTiO_3$ 박막 증착시 Ti Bath 온도와 기판오도 변화에 따른 박막의 증착특성

  • 왕채현 ;
  • 한영기 (한국과학기술연구원 응용물리연구실) ;
  • 염상섭 (한국과학기술연구원 응용물리연구실) ;
  • 최두진 (연세대학교 세라믹공학과)
  • Published : 1996.04.01

Abstract

Keywords

References

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