Enhanced Photoelectrochemical Behavior of Gold-coated Porous n-Si Electrochemically Modified with Polyaniline

  • Published : 1995.12.25

Abstract

The presence of a porous Si layer(PSL) formed on the surface of crystalline silicon by electrochemical etclling in HF solution is found to enhance the stability of n-Si photoanodes, but porous n-Si thus formed is still liable to corrode upon exposure to excitation light. To improve the stability of the porous n-Si electrodes and to reduce the photo-induced corrosion, we have examined the PEC behavior of porous n-Si modified with polyaniline(PANI) and 3 nm thick layer of Au. Comparisons were made between Au/PSL and PANl/Au/PSL photoelectrodes.

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Acknowledgement

Supported by : Korea Research Foundation