한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제28권4호
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- Pages.225-235
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- 1995
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
전처리조건과 기판Bias가 MPECVD 다이아몬드 박막의 특성에 미치는 영향
Effects of Pretreatment Condition and Substrate Bias on the Characteristics of MPECVD Diamond Thin Films
초록
To investigate the effects of pretreatment and substrate bias on the characteristics of the diamond thin films, the thin films were deposited on the p-type Si(100) wafer by MPECVD using mixtures of
키워드