Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 32A Issue 11
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- Pages.44-51
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- 1995
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- 1016-135X(pISSN)
Design and Fabrication Optical Interference Filters using Multiple and Inhomogeneous Dielectric Layers
다층 및 불균일 SiON 박막을 이용한 광간섭필터의 설계 및 제작
Abstract
Homogeneous, compositionally graded, and superlattice-like silicon oxynitride(SiON) dielectric layers, with the refractive index varying from 1.46 to 2.05 as a function of film thickness, were grown by computer-controlled plasma-enhanced chemical vapor deposition (PECVD) using silane, nitrogen, and nitrous oxide reactant gases. An antireflection(AR) coating and thin-film electroluminescent(TFEL) devices with multiple dielectrics were designed and fabricated using real time control of reactant gases of the PECVD system.
Keywords