한국진공학회지 (Journal of the Korean Vacuum Society)
- 제4권S1호
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- Pages.34-39
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- 1995
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- 1225-8822(pISSN)
The Crystalline Quality of Si Films Prepared by Thermal- and Photo-CVD at Low Temperatures
- Chung, Chan-Hwa (Deartment of Chemical Engineering, Seoul National University) ;
- Rhee, Shi-Woo (Pohang Univ. of Science and Technology) ;
- Moon, Sang-Heup (Deartment of Chemical Engineering, Seoul National University)
- 발행 : 1995.02.01
초록
Various silicon films were prepared by thermal- and UV photo-CVD processes. The reactants were SiH4, Si2H6, SiH2F2, SIF4, and H2. Silicon films grown at temperatures below
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