The thermal analysis of te-based media for the optical recording

광기록에 이용되는 Te-based media에 대한 열적 해석

  • 이성준 (광운대학교 전자재료 공학과) ;
  • 천석표 (광운대학교 전자재료 공학과) ;
  • 이현용 (광운대학교 전자재료 공학과) ;
  • 정홍배 (광운대학교 전자재료 공학과)
  • Published : 1995.01.01

Abstract

We discussed the thermal analysis for a recording media with the variation of the laser pulse duration, the laser power and the temperature distribution in order to optimize the Te-based antireflection structure from the computer calculations. In the case that the radial heat diffusion is negligible, we can calculate the maximum temperature of the recording layer at the center of the spot by the Simple Model. The temperature profile of the recording layer is obtained from the Numerical Model by considering the total specific heat and the latent heat. As a result, the effect of the heat sinking acting as a thermal loss for the hole formation could be minimized by introducing the pulse with the hole formation duration(.tau.) below the thermal time constant(.tau.$_{D}$) of a dielectric layer. These requirments can be satisfied by using the dielectric thickness of the 2nd ART(Anti-Reflection Trilayer) condition or the dielectric materials with a low thermal diffusivity.y.

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