Journal of the Korean Magnetics Society (한국자기학회지)

The Korean Magnetics Society (한국자기학회)
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THE EFFECT OF OXYGEN GAS PRESSURE ON THE PROPERTIES OF Pb ADDED Ba-FERRITE SPUTTERED FILMS

  • Morisako, A. (Dept. of Information Engineering, Shinshu Univ.) ;
  • Wada, F. (Dept. of Information Engineering, Shinshu Univ.) ;
  • Matsumoto, M. (Dept. of Information Engineering, Shinshu Univ.) ;
  • Naoe, M. (Dept. of Physical Electronics, Tokyo Inst. of Technology)
  • Published : 1995.10.01
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Abstract

BaM films have a lot of advantage of chemical stability and mechanical stability as compared with a metallic thin film. In this paper, (Ba.Pb)M films have been prepared by using dc magnetron sputtering system and the dependences of their crystallographic characteristics and magnetic properties on oxygen pressure($Po_{2}$) were studied. The films prepared at $Po_{2}$ of around 0.02mTorr exhibit a fine particle-like structure and ${\Delta}{\theta}_{50}$ is as small as $1^{\circ}$. $Hc_{\bot},\;Hc_{//}$ and Ms of (Ba.Pb)M films are 700-800Oe, 200Oe and 180-230emu/cc, respectively.

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References

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