Preparation and structural properties of the Pb(Zr, Ti)${O}_{3}$ thin film by Sol-Gel method

Sol-Gel 법에 의한 Pb(Zr, Ti)${O}_{3}$ 박막의 제조 및 구조적 특성

  • 이영준 (광운대 대학원 전자재료공학과) ;
  • 정장호 (광운대 대학원 전자재료공학과) ;
  • 이성갑 (서남대 전자공학과) ;
  • 이영희 (광운대 전자재료공학과)
  • Published : 1995.07.01

Abstract

In this study, Pb(Zr$_{x}$ Ti$_{1-x}$ )O$_{3}$ (x=0.65, 0.52, 0.35) thin films were fabricated by Sol-Gel method. A stock solution with excess Pb 10[mol%] of Pb(Zr$_{x}$ Ti$_{1-x}$ )O$_{3}$ was made and spin-coated on the Pt/SiO$_{2}$/Si substrate at 4000[rpm] for 30[sec.]. Coated specimens were dried on the hot-plate at 400[.deg. C] for 10[min.]. Sintering temperature and time were 500~800[.deg. C] and 1~60[min.]. The coating process was repeated 6 times and the final thickness of the thin films were about 4800[A]. To investigate crystallization condition, PZT thin films were analyzed with sintering temperature, time and composition by the XRD. The microstructure of thin fulms were investigated by SEM. The ferroelectric perovskite phases precipitated under the sintering of 700[.deg. C] for 1 hours. In the PZT(52/48) composition, dielectric constant and dielectric loss were 2133, 2.2[%] at room temperature, respectively.ively.

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