Abstract
Diamondlike carbon thin film has been fabricated with low discharging frequency, 450KHz by plasma enhanced chemical vapor deposition. Its physical properties such as optical band gap, microhardness and internal stress have been compared with 13.56MHz film. Optical band gap of 450KHz DLC thin film was less than 13.56MHz film and it was found that C-H bond concentration and total hydrogen contents in the film decreased greatly as the result of FT-IR and CHN analysis. Also, when DLC thin film was fabricated with low discharging frequency, it was expected that the adhesion of the film to the substrate was improved by the great decrease of internal stress without any considerable decrease of microhardness.
450KHz 저주파수로 플라즈마 화학증착법을 이용하여 Diamondlike carbon박막을 제작하고 optical band gap, 미소경도, 내부응력 등의 물성에 대하여 13.56MHz의 전원을 사용했을 때보다 optical band gap이 감소하였으며 FT-IR및 CHN분석결과 박막 내의 C-H결합농도와 총 수소의 함량이 크게 감소하는 것으로 밝혀졌다. 또한 저주파수로 DLC 박막을 형성하는 경우 미소경도의 희생없이 내부응력을 크게 줄일 수 있어 기판과의 접착성이 향상될 것으로 기대되었다.