참고문헌
- Thin Solid Films v.80 TiN Coating on Steel R. Buhl;H.K. Pulker;E. Moll
- Thin Solid Films v.101 Adhesion and Hardness of Ion-Plated TiC and TiN Coating E. Hummer;A.J. Perry
- Surface and Coating Technology v.43 no.44 Corrosion Performance of Layered Coatings Produced by Physical Vapour Deposition M.J. Park;A. Leyland;A. Matthews
- Thin Solid Films v.96 A High Rate Sputtering Process for the Fromation of Hard Friction-Reducing TiN Coatings W.D. Munz;D. Hogmann;K. Hartig
- Thin Solid Films v.122 Effects of Substrate Matetial on the Substrate of Reactively Sputtered TiN Films M.K. Hibbs;B.O. Johansson;J.-E. Sundgren;U. Helmersson
- Thin Solid Films v.111 Influence of the Nitrogen Partial Pressure on the Properties of D.C.Sputtered Titanium and Titanium Nitride Films G. Lemperiere;J.M. Poitenvin
- Plasma Chemistry and Plasma Processing v.4 no.1 Plasma Chemical Vapor Deposition of TiN Li Shizhi;Huang Wu;Yang Hongshun;Wang Zhongshu
- Thin Solid Films v.154 TiN Coatings on M2 Steel Produced by Plasma-Assisted Chemical Vapor Deposition M.R. Hilton;G.J. Vandentop;M. Salmeron;G.A. Somorjai
- Thin Solid Films v.165 Plasma-Assisted Chemical Vapour Deposition of TiN and TiC on Steel: Properties of Coatings T. Arai;H. Fujita;K. Oguri
- J. Vac Sci. Technol. v.A7 no.1 The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN Dong Hoon Jang;John S. Chun
- Thin Solid Films v.137 Dependence of the Hardness of Titanium Nitride Prepared by Plasma Chenical Vapour Deposition on the Gas Flow Rate and the RF Power Ryoji Makabe;Sadao Nakajima;Osamu Tabaka;Masaki Aoki
- Thin Solid Films v.139 Composition, Morphology and Mechanical Properties of Plasma-Assisted Chemical Vapor-Deposited TiN Films on M2 Tool Steel M.R. Hilton;L.R. Narasimhan;S. Nakamura;M. Salmeron;G.A. Somorjai
- J. Vac. Sci. Technol. v.A4 no.6 TiN-Coated High-Speed Steel Cutting Tools H. Randhawa
- J. Vac. Sci. Technol. v.A4 no.6 Chemical Vapor Deposition and Physical Vapor Deposition Coatings: Properties, Tribological Behavior, and Applications K.H. Habig
- J. Vac. Sci. Technol. v.A6 no.3 Mechanical Property and Structure Relationships in Hard Coations Dennis T. Quinto
- Thin Solid Films v.169 The Effect of Reactant Gas Composition on the Plasma-Enhanced Chemical Vapour Deposition of TiN Dong Hoon Jang;John S. Chun;Jae Gon Kim
- J. Vac. Sci Technol. v.A9 no.4 The Effecs of Chlorine Content on the Properties of Titanium Carbonitride Thin Film Deposited by Plasma Assisted Chemical Vapor Deposition Si Bum Kim;Si Kyung Choi;Soung Soon Chun;Kwang Ho Kim
- International Center for Diffraction Data, Card 38-1420 Powder Diffraction File Joint Committee on Powder Standards
- Thin Solid Films v.118 Morphology and Structure of Ion-Plated TiN, TiC and Ti(C, N) Coatings H.M. Gabriel;K.H. Kloos
- Materials Science and Engineering v.A139 On the Adhesion of Plasma-Deposited TiN on M2 Steel F.H.M. Sanders
- J. Vac. Sci. Technol. v.A7 no.3 Ar and Excess N Incorporation in Epitaxial TiN Films Grown by Reactive Bias Sputtering in Mixed Ar/N₂and pure N₂Discharges L. Hultman;J.-E. Sundgren;L.C. Markert;J.E. Greene
- Surface Coatings and Technology v.36 Adhesion Scratch Testing: Round-Robin Experiment A.J. Perry;J. Valli;P.A. Steinmann