PHOTOELASTIC ANALYSIS OF STRESSES INDUCED BY VARIOUS SUPERSTRUCTURES ON THE ENDOSTEAL IMPLANT

치과 임플랜트 보철 수복시 각 상부구조의 형태에 따라 발생되는 응력의 광탄성학적 분석

The osseointegrated implant conducts the stress directly to the bone due to lack of cushoning effect of periodontal ligament. So, the design and material quality of superstructure plays an important role in resolution and diffusion of stress. Recently, the various superstructures have been developed to improve esthetics and resolve various complicated conditions. The purpose of this study was to evaluate the stress induced by various system on the osseointegrated implant using UCLA abutment, EsthetiCone abutment, Anatomic abutment as well as Branemark conventional abutment. The stress distribution was evaluated by the photoelastic method which can simultaneously observe all around stress distribution. The superstructures embedded in epoxy resin specimen were loaded at various angle with a force of 15Kg to analyse the stress distribution of the fixture. The results of this study were obtained as follows : 1. Under vertical loading, the large and broad stress was distributed below the fixture in all systems. 2. The fringe order of the stress was increased in proportion to tillting the specimen. The largest stress was shown in 25 angled degree tilting case. 3. The Branemark conventional abutment showed the lowest value, and EsthetiCone abutment, Anatomic abutment and UCLA abutment showed the stress value in accending order.